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Conferences > CLEO > 1981 > THH > THH5

Laser photochemistry at surfaces for applications in microelectronics

D. J. Ehrlich, R. M. Osgood, and T. F. Deutsch

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Abstract

Recently several new techniques have been demonstrated for laser photochemical production of microstructures on semiconductors and insulators.1 In this type of laser photochemistry, a focused UV laser beam is used to control the spatial extent and chemical products of a highly localized photolytic reaction at a gas-solid interface. Micrometer-sized deposited and etched features have been produced with < 1 mW of laser power at 257 nm.

© 1981 Optical Society of America

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