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Application of pulsed-VU laser Haman spectroscopy to chemical vapor deposition

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Abstract

KrF laser-excited spontaneous Raman spectroscopy was investigated as a diagnostic to study the mechanism leading to the deposition of a thin solid film from the pyrolytic decomposition of one or several gases. This mechanism has never been established, partly because of the difficulty in determining the gas phase composition in an operational chemical vapor deposition (CVD) reactor.

© 1981 Optical Society of America

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