Abstract

Very high intensity laser-plasma x-ray sources have been developed over the past ten years. In addition, it has been demonstrated that a relatively small, high repetition rate laser is a most attractive high average power source of x-rays in the ¾ to 2 keV range for general industrial or laboratory applications. This energy range is particularly significant for x-ray microlithogrphy of integrated circuits. A relatively low-cost system with an anticipated output of a few tenths of a watt of x-rays in the above energy range will be discussed. An interesting advantage of the laser plasma x-ray source is the small source diameter, about 50 µm.

© 1982 Optical Society of America

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