Abstract

Chemical vapor deposition (CVD) techniques are used throughout the semiconductor industry to fabricate multiple-layer device structures. For example, in the expitaxial deposition of InP,1 indium is transported in the form of InCI [formed in the high temperature reaction of ln(I) with HCI], while phosphorus impinges on the substrate surface as a mixture of PH3, P2, and P4 (formed in the pyrolysis of PH3).

© 1982 Optical Society of America

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