Abstract

A laser scanning microscope has been developed which permits in-process inspection of patterned semiconductor wafers. In addition to its ability to produce images similar to those obtained using conventional microscopes, tine laser microscope can produce an image of the particulates contaminating the semiconductor surface without imaging the pattern itself. These separate images (in video format) can be combined through addition and subtraction to produce other useful images.

© 1982 Optical Society of America

PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription