Abstract

Laser photochemical deposition (LPD) and laser chemical vapor deposition (LCVD) have been used to prepare delineated thin metallic films on a variety of substrates from organometallic vapors. Work elsewhere has shown the techniques to be suitable for semiconductor device fabrication.1,2 The organometallic species, with room temperature vapor pressures in the 10-100-Torr region, are flowed with a carrier gas into a stainless steel cell having a laser input window.

© 1982 Optical Society of America

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