Abstract
Pulsed UV excimer lasers have been used to perform a variety of semiconductor processing operations, including doping, deposition of insulating films, and patterning of a new high-resolution self- developing photoresist. The UV photos are capable of breaking bonds in many molecules, releasing dopant atoms, or initiating chemical reactions. In addition, the short penetration depth of the UV radiation into Si allows efficient surface heating which can lead to pyrolysis, incorporation of dopant atoms, or recrystallization.
© 1983 Optical Society of America
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