Abstract

To achieve depositions with the small radiai dimensions necessary for microelectronics applica- fions, the effect of the deposition variables on the laser chemical vapor deposition (LCVD) deposit diameter must be understood. The spot or line dimensions are functions of the laser spot size, irradiation time, intensity, and deposition rate of the reaction. The deposition rate is influenced by the thermodynamics and kinetics of the reaction, diffusion of reactants to the deposition site, and nucleation. Other factors which affect both the deposition thickness and the diameter are changes in the optical properties of the surface as the film is being deposited.¹

© 1983 Optical Society of America