Abstract

In photodeposition¹ the atomic metal vapor for film growth is created by photodissociation of organometallic encapsulent molecules. Since the excitation is based on a direct-electronic transition, heating of the substrate is inconsequential. The submicrometer spatial resolution of the process derives partly from surface nucleation by adlayer photodissociation. Using photodeposition, it is possible to direct write submicrometer metal lines with low-power cw lasers and to produce high-resolution images with both cw and pulsed lasers.

© 1983 Optical Society of America