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Microscopic model for the ablative photodecomposition of polymers by far-ultraviolet radiation (193 nm)

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Abstract

Short pulses of far-UV (193-nm) laser radiation are capable of etching organic polymer films without melting the remaining sample. This process is called ablative photodecomposition. The mechanism that has been proposed for this process attributes ablation to the increase in volume that accompanies the photolysis of the polymer. A model of the microscopic process is presented here.

© 1984 Optical Society of America

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