Abstract
Various applications of local laser-driven pyrolytic reactions in the fabrication and restructuring of planar silicon-based integrated circuits have recently been reported.1-3 This method of using visible laser-driven micron-scale thermal processes to deposit locally dope or etch materials may prove to be a competitive approach in some aspects of producing highly integrated customized circuits and in repairing circuits. Recent advances in this area will be reviewed.
© 1984 Optical Society of America
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