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Conferences > CLEO > 1985 > THM > THM16

Pulse-length studies of polymer etching with excimer lasers: in search of two-photon and saturated absorptions

C. S. GUDEMAN, J. DONELON, and FAHFU HO

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Abstract

In an effort to better understand the mechanism by which organic polymers are ablatively etched when exposed to high-energy puises of UV laser radiation, we have examined the etch rate dependence of AZ photoresist, poly(methylmethacrylate), and polyimide on laser fluence (mj/cm2/pulse) and laser pulse length. The temporal length of an excimer laser pulse at 308 nm has been doubled by combining two 40-nsec puises of which one had been retarded by means of a 12-m optical delay line.

© 1985 Optical Society of America

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