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Mechanism of damage formation in antireflection coatings

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Abstract

In a recent letter,1 Yoshida et al. developed a porous dielectric antireflection (AR) coating and achieved a damage threshold of 6-8 J/cm2 at 355 nm (τp = 0.4 ns) and 12–13 J/cm2 at 527 nm and 1053 nm (τp = 1 ns). Although no physical mechanisms were resolved, the result seems to be an attractive subject for a theoretical work and a subsequent experimental work.

© 1986 Optical Society of America

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