Abstract
Excimer laser-induced etching has recently received significant attention motivated by applications in microelectronics and medicine and by long-standing interest in optical damage phenomena. The basic etching mechanisms usually considered are thermal vaporization, photodecomposition involving weakened or repulsive chemical bonds (also termed electronic sputtering), exfoliation, microscopic droplet formation and ejection, and collisional sputtering due to fast atoms or ions.1
© 1986 Optical Society of America
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