Abstract

Excimer laser images of mask patterns have been used to photolyze organoaluminum vapors inside a triisobutyl aluminum (TIBA) chemical vapor deposition reactor at operating temperature (250°C). The deposits resulting from this photolysis serve to activate the thermal decomposition of TIBA to form thin films of Al. Patterned Al deposits have already been obtained with feature widths as small as 4 μm and resistivities as low as 50 μΩ cm. The technique shows promise for large-area fine-featured metallization applications.

© 1986 Optical Society of America