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Metal alloy film deposition by laser breakdown chemical vapor deposition

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Abstract

Gas phase laser techniques for chemical vapor deposition (CVD) provide the advantages of low substrate temperature, cold walls, and limited reaction volume to the manifest advantages of good step coverage and low resistivity of thermal CVD metallizations. Using a pulsed CO2 laser operating at 10.6 μm, where there is no significant resonant absorption in any of the source gases, we succeeded in depositing elemental and alloy films from a number of gas phase precursors.1 Metastable phases can be formed in the deposited film if the surface energy of the deposited species is Insufficient for rearrangement to the equilibrium crystalline phase. Using this technique, we have formed metastable crystalline compounds in thin-film structures.2 The present work involves the deposition of metal alloys of molybdenum and nickel. The Mo–Ni alloy system is known to form metastable amorphous alloys over a fairly broad range of alloy compositions, and these have been proposed as diffusion barrier metallizations.3

© 1986 Optical Society of America

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