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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1988),
  • paper WX2

Laser-induced surface desorption for low-coverage chlorine on copper

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Abstract

The desorption experiments are performed in an UHV environment. The mass spectrometer is located in a detector chamber at a pressure of 10−11 Torr, and the time-of-flight (TOF) flight path is 5.6 cm. A pulsed Cl2 molecular beam doses the clean Cu sample surface prior to each laser pulse, allowing UHV conditions on the laser-induced surface desorption. Experiments are done for both single-crystal and polycrystalline Cu samples, and no differences in the experimental results are observed for these two types of Cu surface.

© 1988 Optical Society of America

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