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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1990),
  • paper CWF53

Effect of intense and prolonged 248-nm laser irradiation on the properties of fused silica

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Abstract

Fused silica of UV grade is frequently used in excimer laser work stations and lithographic steppers utilizing KrF lasers at 248 nm. Such UV silica materials, available under commercial names of Suprasil, Corning 7940, Dynasil, and so on, typically contain a substantial amount of OH (up to 0. 1%) to increase their laser damage resistance. The important question of the survivability of such materials in a KrF excimer laser beam has been studied by Stathis and Kastner1 and Escher.2 The latter study explored energy fluences up to 275 mJ/cm2 with up to 2 million pulses of irradiation. The present work not only extends the fluence and number of pulses but also examines the associated (but not necessarily monotonic) changes in absorption, birefringence, UV spectrum, OH content, physical dimensions, and sample temperature up to 50 million pulses. All samples tested exhibit permanent changes in these properties after prolonged use.

© 1990 Optical Society of America

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