Abstract
Ion implantation is a very useful technique which can be used to modify the optical properties of insulators.1 In particular, much interest has been caused by the ability to create a refractive index profile so that optical waveguides and integrated optical devices can be fabricated. A large amount of work has been carried out on crystals such as LiNbO3 which is of interest due to its high electrooptic coefficient. However, due to the physical nature of the ion implantation process, refractive index changes and hence optical waveguides can be created in a wide range of crystals. This raises the possibility of creating waveguides in very many interesting solid state laser systems, and such waveguides have potentially very low thresholds for laser operation if the guide losses and other cavity toss mechanisms can be kept small.
© 1990 Optical Society of America
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