Optical studies of discharge instability in KrF lasers

Mina Sakano; Tohru Tamagawa; Ken Ishikawa; Ken Ishikawa

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1991),
paper CThA2

Optical studies of discharge instability in KrF lasers

Mina Sakano, Tohru Tamagawa, and Ken Ishikawa

Conference on Lasers and Electro-Optics 1991

Baltimore, Maryland United States
12–17 May 1991
ISBN: 1-55752-189-1

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Rare Gas Fluoride Lasers (CThA)

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M. Sakano, T. Tamagawa, and K. Ishikawa, "Optical studies of discharge instability in KrF lasers," in Conference on Lasers and Electro-Optics, J. Bufton, A. Glass, T. Hsu, and W. Krupke, eds., Vol. 10 of OSA Technical Digest (Optica Publishing Group, 1991), paper CThA2.

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Abstract

Discharge-pumped excimer lasers operating with a high-repetition rate (higher than 1 kpps) are required for many industrial applications such as microlithography, photoablation, and chemical reaction.¹

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