Abstract
Hollow-cathode discharge (HCD) research has been an active field in metal vapor laser (MVL) development, because the metal vapor produced by sputtering depends upon the HCD conditions. In the HCD literature there is extensive experimental information about the low and high voltage current (V-I) regime of HCD without a model that describes a relationship between these voltage and current measurements to the particles densities and plasma properties.
© 1992 Optical Society of America
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