Abstract

A hybrid lithography technique, Talbot interference lithography (TIL) that combines Talbot lithography (TL) and interference lithography (IL) is analyzed in this paper. In a single lithography step, the method is able to print custom defined periodic patterns that inherit the resolution limit from IL together with the flexibility of lattice design from Talbot lithography. The arbitrary shaped cells produced by the TL can be filled with fine interference patterns. In addition, TIL relaxes constrains in the mask fabrication and simultaneously expands the depth of focus, printing nanopatterns in high resolution with low NA.

© 2016 Optical Society of America