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Spectroscopic Characterization of Si/Mo Thin-film Stack at Extreme Ultraviolet Range

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Abstract

A common-path interferometry based extreme ultraviolet (EUV) spectrometer was used to characterize a Si/Mo thin-film beamsplitter. The complex transfer function of the Si/Mo stack was successfully obtained and verified near the pristine 13.5-nm wavelength range.

© 2017 Optical Society of America

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