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Conferences > CLEO_Apps > 2010 > AFA > AFA4

Laser Produced Plasma Light Sources for EUV Lithography

Bruno La Fontaine

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Abstract

We present the latest results on high-power extreme-ultraviolet (EUV) light sources for lithography. This includes operation of high-power pulsed CO2 lasers, high repetition-rate Sn droplet targets, and collection of EUV light using multilayer-coated optics.

© 2010 Optical Society of America

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