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  • 2019 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference
  • OSA Technical Digest (Optica Publishing Group, 2019),
  • paper ce_10_2

Si/SiO2 dispersive optics paves the way to ultrafast mid-infrared lasers

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Abstract

Advanced broadband dispersive multilayer optical components have become key elements in modern laser systems [1]. Along with well-known dispersive mirrors operating effectively in the systems based on Ti:Sa lasers (~800 nm) and near-infrared Yb:YAG lasers (~1030 nm), the dispersive optics technology is being used in 2-µm laser systems based on Thulium- and Holmium[2]. Further development of the technology based on 2.4 µm Cr:ZnS-lasers will extend laser output to 3.2 µm [3,4]. Availability of dispersive optics covering the spectral range from 2 to 3.2 µm is demanded for this promising technology. Until now, the best achievements in this direction was a 1/3-octave dispersive mirror operating in the range 2.2-2.7 µm with the group delay dispersion of -200 fs2 and a high-reflector compensating the third-order dispersion of -3000 fs3[5].

© 2019 IEEE

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