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Conferences > CLEO_SI > 2019 > SF2O > SF2O.4

UV Laser Resist-Mask Writing for Low-Cost Prototyping of Integrated Optical Devices

Dawson B. Bonneville, Manuel Arturo Méndez-Rosales, Henry C. Frankis, and Jonathan D. B. Bradley

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Abstract

We report on UV-laser photoresist-mask writing as a tool for fabricating integrated optical waveguides. We investigate feature width and roughness under different write settings and apply the technique to realize integrated Si3N4 waveguides and devices.

© 2019 The Author(s)

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