Abstract

In this paper we present a novel approach for realizing super resolved photo-lithographic recording based upon multi-stage recording of the desired structure while illuminating our photo-resist layer through a layer of photo-activated self-assembled nano-structures. Since our photo resist layer is being illuminated through the layer of the nano-structures, the patterns of the nano structures are being projected on top of the photo-lithographic layer and used to record the desired super resolved, sub wavelength spatial structure. This desired super resolved outcome of the photo-lithographic process is obtained by accumulated impact obtained on the photo-resist when performing multiple projections from different angular illuminations of properly encoded low resolution patterns projected, as previously indicated, through the self-assembled nano-structures.

© 2017 Optical Society of America