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Theoretical and Experimental Demonstration of a State-of- the-Art Dark-Field Holographic Microscope for Advanced Semiconductor Metrology

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Abstract

We describe a dark-field holographic microscope, that aims to surpass metrology requirements with novel phase-DBO measurements. We present parameters that improve overlay (OV) metrology and test the validation of our analysis with an experimental demonstration.

© 2019 The Author(s)

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