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Laser-Produced Plasma EUV Sources

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Abstract

Progress in laser-produced plasma EUV generation for advanced micro-lithography is reviewed and compared with industry requirements. Performance of a high power diode-pumped Nd:YAG laser and a xenon target is presented, demonstrating that intense emission and clean operation are feasible, and these sources can meet EUV power requirements for high-volume manufacturing.

© 2003 Optical Society of America

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