Arbitrary 2-D Pattern Formation Beyond the Rayleigh Limit

Sean J. Bentley

doi:10.1364/FIO.2007.FWC1

Frontiers in Optics 2007/Laser Science XXIII/Organic Materials and Devices for Displays and Energy Conversion
OSA Technical Digest (CD) (Optica Publishing Group, 2007),
paper FWC1
•https://doi.org/10.1364/FIO.2007.FWC1

Arbitrary 2-D Pattern Formation Beyond the Rayleigh Limit

Sean J. Bentley

Frontiers in Optics 2007

San Jose, California United States
16–20 September 2007
ISBN: 1-55752-846-2

From the session
Complex Light Fields (FWC)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
S. J. Bentley, "Arbitrary 2-D Pattern Formation Beyond the Rayleigh Limit," in Frontiers in Optics 2007/Laser Science XXIII/Organic Materials and Devices for Displays and Energy Conversion, OSA Technical Digest (CD) (Optica Publishing Group, 2007), paper FWC1.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

A relatively simple new technique to generate arbitrary two-dimensional patterns in a multi-photon absorber with resolution exceeding the Rayleigh limit has been developed. This four-beam interference technique could greatly extend photolithography capabilities.

PDF Article

More Like This

Beyond the Rayleigh Limit in Optical Lithography

M. Suhail Zubairy
FTuM1 Frontiers in Optics (FiO) 2011

Sub-Rayleigh Lithography using a Multiphoton Absorber

Heedeuk Shin, Malcolm N. O’Sullivan-Hale, Hye Jeong Chang, and Robert W. Boyd
JWC33 International Conference on Quantum Information (QIM) 2007

Quantum Entanglement for Optical Lithography and Microscopy Beyond the Rayleigh Limit

Sean J. Bentley, Robert W. Boyd, Elna M. Nagasako, and Girish S. Agarwal
QTuD2 Quantum Electronics and Laser Science Conference (CLEO:FS) 2001

Previous Article Next Article