Abstract
We report on a new research and development program at the Advanced Light Source, Lawrence Berkeley National Lab directed to establish both at-wavelength and conventional optical metrology techniques suitable to characterize the surface profile of super-high-quality x-ray optics with sub-microradian precision.
© 2009 Optical Society of America
PDF ArticleMore Like This
Anatoly Snigirev
FThG2 Frontiers in Optics (FiO) 2009
R.N. Watts, D.L. Ederer, T.B. Lucatorto, and M. Isaacson
FA3 Soft X-Ray Projection Lithography (SXRAY) 1991
E. M. Gullikson and J. H. Underwood
TuD.17 Soft X-Ray Projection Lithography (SXRAY) 1993