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Characterization of a low voltage micro-electron-column for scan field size and visibility of current image

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Abstract

Many optical technologies have been applied in fabrication of a micro-electron-column. Laser aid optical alignment and in-situ laser bonding technology were introduced in assembling basic components of micro-electron column with accuracy less than ±4% for maximum aperture size. The combination of source lenses and Einzel lenses was performed with the method of diffraction compensation and simultaneous laser bonding. The optical technology for focusing and manipulating electron beam was applied for the optimal operation for many applications such as large area scanning LCD panel and aberration compensated beam shaping for fine scanning communication devices. The fully assembled low voltage micro-column showed good scanning properties with aid of optical theory and technology. Many optical results in experiments and theory will be introduced in fabrication of micro-electron-column.

© 2010 Optical Society of America

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