Extreme Ultraviolet Talbot Lithography

W. Li; V. Martinez-Esquiroz; L. Urbanski; D. Patel; C. S. Menoni; M. C. Marconi; A. Stein

doi:10.1364/FIO.2013.FTh2F.3

Frontiers in Optics 2013
OSA Technical Digest (online) (Optica Publishing Group, 2013),
paper FTh2F.3
•https://doi.org/10.1364/FIO.2013.FTh2F.3

Extreme Ultraviolet Talbot Lithography

W. Li, V. Martinez-Esquiroz, L. Urbanski, D. Patel, C. S. Menoni, M. C. Marconi, and A. Stein

Frontiers in Optics 2013

Orlando, Florida United States
6–10 October 2013
ISBN: 978-1-55752-987-9

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Three-Dimensional Optical Structure II (FTh2F)

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W. Li, V. Martinez-Esquiroz, L. Urbanski, D. Patel, C. S. Menoni, M. C. Marconi, and A. Stein, "Extreme Ultraviolet Talbot Lithography," in Frontiers in Optics 2013, I. Kang, D. Reitze, N. Alic, and D. Hagan, eds., OSA Technical Digest (online) (Optica Publishing Group, 2013), paper FTh2F.3.

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Abstract

Talbot lithography was used to fabricate defect-free periodic metal nanostructures from a damaged master in a table top system with a compact extreme ultraviolet laser.

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