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Conferences > FiO > 2018 > JW4A > JW4A.21

A Fabrication of Nanostructures with a Transmission Light and a Plasmonic Field at Different Z-axis Position

Taeyeon Kim, Heesang Ahn, Hyerin Song, Jong-ryul Choi, and Kyujung Kim

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Abstract

We fabricated two hole-array pattern masks and observed the differences between conventional photolithography and plasmonic lithography by controlling the gap distance between the mask and the photoresist

© 2018 The Author(s)

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