Abstract

The steep shapes and sharp angles often present in Freeform and Conformal optics pose a challenge for traditional optical coating techniques. A novel thin film deposition technology, Atomic Layer Deposition (ALD), enables very uniform coatings over any shape. ALD optical coatings are pin-hole free and exhibit high density, robustness, good adhesion, low loss and absorption, and no spectral shift with humidity. The self-limiting nature of the process yields atomic level control of thickness which results in exceptional optical performance across complex surfaces.

© 2017 Optical Society of America