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Conferences > IPRSN > 2015 > IT2A > IT2A.2

Thermal probe nanolithography for novel photonic devices

Felix Holzner, Philip Paul, Colin Rawlings, Heiko Wolf, Urs Dürig, and Armin W. Knoll

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Abstract

A novel alternative to E-beam lithography, in particular for plasmonic and nanophotonic devices, is presented. Patterning resolution and speed are similar; however, the novel technique enables direct 3D lithography and markerless overlay with sub-5 nm accuracy.

© 2015 Optical Society of America

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