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Modelling the Performance of Photochromic Thin Films to Achieve Super-resolution Nanopatterning by Absorbance Modulation at Low Light Intensity

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Abstract

This paper presents a comprehensive model and simulation results of the performance and governing factors of the photochromic layer in Absorbance-Modulation-Optical-Lithography (AMOL) and examines the possibility of performing AMOL at low light intensities.

© 2016 Optical Society of America

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