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Ion Assisted E-beam Deposition of SiO2 Thin films with Graded Refractive Index

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Abstract

we report the Design and fabrication of SiO2 films using GLAD technique with different incidence angles from 10° to 80° by Ion Assisted E-beam deposition resulting in the decrease of effective film refractive index from1.46 to 1.38.

© 2018 The Author(s)

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