Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

High Plasmonic Quality Titanium Nitride Thin Films on Si (001) with MgO Buffer

Not Accessible

Your library or personal account may give you access

Abstract

We demonstrate high plasmonic quality TiN on Si (001) via PE-ALD. Employment of an MgO buffer improved the figure of merit (FoM) at 1550 nm from 2.0 to 2.5 and the peak FoM from 2.4 to 2.8.

© 2019 The Author(s)

PDF Article
More Like This
Optimization of Titanium Nitride Films using Plasma Enhanced Atomic Layer Deposition

Ray Secondo, Vitaliy Avrutin, Ümit Özgür, and Nathaniel Kinsey
JTh2A.75 CLEO: Applications and Technology (CLEO:A&T) 2018

Optimized Growth of Titanium Nitride Films Using Plasma-Enhanced Atomic Layer Deposition

Dhruv Fomra, Ray Secondo, Vitaliy Avrutin, Natalia Izyumskaya, Kai Ding, Ümit Özgür, and Nathaniel Kinsey
JTu2A.22 Frontiers in Optics (FiO) 2018

Atomic Layer Deposition of Titanium Nitride for Robust Plasmonic Color Security Devices

Dhruv Fomra, Kai Ding, Vitaliy Avrutin, Ümit Özgür, and Nathaniel Kinsey
JW4A.123 Frontiers in Optics (FiO) 2019

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved