Loss reduction of electron-beam lithography fabricated strip wire waveguide bends

Jens Høvik; Astrid Aksnes

doi:10.1364/BGPPM.2018.JTu5A.19

Advanced Photonics 2018 (BGPP, IPR, NP, NOMA, Sensors, Networks, SPPCom, SOF)
OSA Technical Digest (online) (Optica Publishing Group, 2018),
paper JTu5A.19
•https://doi.org/10.1364/BGPPM.2018.JTu5A.19

Loss reduction of electron-beam lithography fabricated strip wire waveguide bends

Jens Høvik and Astrid Aksnes

Photonic Networks and Devices 2018

Zurich Switzerland
2–5 July 2018
ISBN: 978-1-943580-43-9

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Joint Poster Session II (JTu5A)

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J. Høvik and A. Aksnes, "Loss reduction of electron-beam lithography fabricated strip wire waveguide bends," in Advanced Photonics 2018 (BGPP, IPR, NP, NOMA, Sensors, Networks, SPPCom, SOF), OSA Technical Digest (online) (Optica Publishing Group, 2018), paper JTu5A.19.

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Abstract

Electron-beam lithography causes segmentation in curved components due to the fracturing of the mask pattern file. We investigate this effect and optimize the segmentation to achieve low-loss photonic strip-wire waveguide bends.

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