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Conferences > OFC > 2019 > Th2A > Th2A.6

All-Si metasurface polarizing bandpass filter mass produced on 12 inch wafer

Z. J. Xu, Y. Dong, C.-K. Tseng, T. Hu, J. C. Tong, Q. Z. Zhong, L. Sim, K. H. Lai, Y. Lin, D. D. Li, Y. Li, V. Bliznetsov, Y. H. Fu, S. Y. Zhu, Q. Y. Lin, D. H. Zhang, D. L. Kwong, and Y. D. Gu

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Abstract

We report all-Si metasurface based polarizing bandpass filter (PBF) fabricated on 12 inch wafer, employing CMOS-compatible 193nm ArF DUV immersion lithography and ICP etch. The fabricated metasurface PBF work on dual short wave infrared bands.

© 2019 The Author(s)

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