Advanced Laser Annealing Technology in FPD Industries

Tomoyuki Akashi; Toshio Kudo; Kazunori Yamazaki

Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies
Technical Digest (CD) (Optica Publishing Group, 2004),
paper PTuB3

Advanced Laser Annealing Technology in FPD Industries

Tomoyuki Akashi, Toshio Kudo, and Kazunori Yamazaki

Photonic Applications Systems Technologies Conference 2004

San Francisco, California United States
ISBN: 1-55752-770-9

From the session
Lasers in Manufacturing I (PTuB)

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T. Akashi, T. Kudo, and K. Yamazaki, "Advanced Laser Annealing Technology in FPD Industries," in Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optica Publishing Group, 2004), paper PTuB3.

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Abstract

The next generation excimer and DPSS laser annealing technology applied to low-temperature poly-SiTFT process is reviewed from a standpoint of the future trend of FPD industries, especially focusing on the DPSS lasers.

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