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Conferences > PhAST > 2007 > PThC > PThC7
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • OSA Technical Digest (CD) (Optica Publishing Group, 2007),
  • paper PThC7
  • •https://doi.org/10.1364/PHAST.2007.PThC7

High power EUVL source demonstration of tin-doped droplet laser plasma generated by industrial solid state lasers

K. Takenoshita, T. Schmid, S. A. George, J. Cunado, M. C. Richardson, B. Fulford, I. Hendarson, N. Hay, and S. Ellwi

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Abstract

High EUV source power has been demonstrated with a laser-plasma source exhibiting low debris and high conversion efficiency. This offers a viable path towards successful realization of EUV lithography for the next generation semiconductor devices.

© 2007 Optical Society of America

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