Abstract

We introduced a new technique of fabricating optical waveguides by first preferentially etching the waveguide grooves, which can be either cusp-shaped or cup-shaped in cross section, and then filling the grooves with organic films by solution-deposition technique. With the chemical etching technique, perfectly smooth reflecting waveguide walls and well-defined waveguide profiles can be easily produced and reproduced with an accuracy that no other existing fabrication techniques can achieve. In our experiments, silicon was chosen as the base material for possible future integration of optical and electronic components.

© 1975 Optical Society of America

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