Abstract

A number of nonvacuum techniques applicable in optical thin-film technology are described in some detail. The following are presented: ideal thin optical layers; monocrystalline coatings grown by liquid phase epitaxy; atomic-monolayer growth; chemical aerosol decomposition; spinning and dipping; galvanocoating or electrochemical processing; chemical etching; metal annealing and (laser) annealing of amorphous films.

© 1985 Optical Society of America

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