Abstract

Microstructural studies have been made on a series of evaporated and sputtered silver films vacuum annealed at temperatures up to 250°C. The films were nondestructively removed from fused quartz substrates. The changes in microstructure with annealing have been correlated with changes in topography and scattering reported in Part 1 [ J. M. Bennett et al., Appl. Opt. 24, 2701 ( 1985)]. Mechanisms are suggested to explain the microstructural changes.

© 1985 Optical Society of America

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