High-resolution x-ray lithography using a phase mask

Abstract

A new high-resolution pattern replication method is proposed for an x-ray lithography system. To obtain high resolution, a phase mask is used which gives rise to the phase shift of nπ (n = 0 or 1) for the transmitted waves. This method gives high quality replication even where the conventional transmission–absorption type mask cannot be used effectively due to diffraction. The numerical results and a basic experiment carried out with laser light show the usefulness of this method.

© 1986 Optical Society of America

Resolution enhancement for advanced mask aligner lithography using phase-shifting photomasks

T. Weichelt, U. Vogler, L. Stuerzebecher, R. Voelkel, and U. D. Zeitner
Opt. Express 22(13) 16310-16321 (2014)

Quantitative imaging using high-energy X-ray phase-contrast CT with a 70 kVp polychromatic X-ray spectrum

Adrian Sarapata, Marian Willner, Marco Walter, Thomas Duttenhofer, Konradin Kaiser, Pascal Meyer, Christian Braun, Alexander Fingerle, Peter B. Noël, Franz Pfeiffer, and Julia Herzen
Opt. Express 23(1) 523-535 (2015)

A phase demodulation method with high spatial resolution for two-dimensional single-shot X-ray Talbot interferometry

Kentaro Nagai, Genta Sato, Takashi Date, Soichiro Handa, Kimiaki Yamaguchi, Takeshi Kondoh, and Takashi Nakamura
Opt. Express 22(4) 4316-4328 (2014)

Soft x-ray radiation from laser-produced plasmas: characterization of radiation emission and its use in x-ray lithography

Michael Kühne and Hans-Christian Petzold
Appl. Opt. 27(18) 3926-3932 (1988)

Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography

Xu Ma and Gonzalo R. Arce
Opt. Express 17(7) 5783-5793 (2009)