Abstract

A visible-light microscope has been modified to obtain deep UV (190–350-nm) images using reflected illumination. Potential advantages of deep UV microscopy include better resolution, depth of focus, and contrast for certain materials and fewer artifacts when viewing multilayered structures. These advantages are especially useful when viewing organic or semiconducting materials that are transparent or colored when viewed with visible light but are completely opaque when viewed using deep UV wavelengths. The hardware and optics of this microscope are described, and several uses are proposed for integrated circuit manufacture.

© 1990 Optical Society of America

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