Abstract

We developed a new technique for the repair of opaque defects on soft-x-ray projection lithography reflection masks by using ion-beam etching and a thin Si overcoat on the multilayer mirror. This technique clears the defect without damaging the multilayer mirror or introducing an absorptive element into the multilayer. Our procedure uses a beam of low atomic number ions (Si or Ar) of reduced beam energy and a thin Si overcoat to protect the multilayer mirror.

© 1993 Optical Society of America

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