Abstract

Optical constants (n and k) of Co20Fe60B20 (CoFeB) thin films (2–40 nm) are measured by using the interference enhancement method with spectroscopic ellipsometry in the wavelength range of 270–1600 nm. The effects of film thickness, protection layer, and annealing process on the optical constant of CoFeB film are investigated. In the range of 40–10 nm, both n and k decrease with the decrease of thickness. The protection layer of SiO2 on the CoFeB film is helpful for the precise measurement of the n and k values. The annealing process has less effect on the optical constant of the film with the protection layer as compared to the one without it.

© 2015 Optical Society of America

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